Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusWS-650-23 B Spin

Applied Materials 0010-03485 Magnet Assy, Laurell WS-650-23 B Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsLaurell
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyLaurell WS-650-23 B Spin
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Maximum Substrate Size—ø150 mm wafers; 5" × 5" (127 mm × 127 mm) substrates[5]
Maximum Rotational Speed—12,000 RPM (based on a ø100 mm silicon wafer)[5]
Process Controller—650-series microprocessor controller with PC software support (Spin 3000); real-time interaction, pausing, stopping, and continuation[5]
Power Requirements—95 to 240 VAC, 47/63 Hz, ~300 W[5]
Vacuum Requirements—25–28 inHg (635–711 mm Hg) with flow 4.5 SCFM (0.127 m³/min) at 0 inHg[5]
Nitrogen Purge Pressure—60–70 PSIG (4–5 bar) of N₂ or CDA; consumption 3 ft³/h (0.085 m³/h) for standard motor, 20 ft³/h (0.566 m³/h) for high-performance motor[5]
Housing Material—Solid co-polymer blend (proprietary); optional PTFE (Hostaflon TFM-1600 / Teflon AF) for high-temperature chemistry[5]
Safety Certifications—ETL, UL, CSA, CE, RoHS compliant; door interlock, vacuum interlock, lid interlock[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]laurell.comlaurell.com