Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Cascade Microtech Elite 300, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Elite 300Cascade Microtech |
|---|---|---|
| OEM | Applied Materials | Cascade Microtech |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Cascade Microtech Elite 300 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | WP AL 300mm PVD[2] | — |
| OEM | Applied Materials[2] | — |
| Model | 0010-03485[2] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[3] | — |
| Process | PVD[4] | — |
| Wafer size | 300mm[5] | 12 inch[6] |
| Version | Spares[5] | — |
| Part Number | 0010-03485[2] | — |
| Manufacturer | Applied Materials[2] | — |
| Process Type | PVD (Physical Vapor Deposition)[2] | — |
| Application (Material) | Aluminum (AL)[2] | — |
| Wafer Diameter (associated) | 300 mm[2] | — |
| Chuck material | — | Nickel plated aluminum[7] |
| Chuck type | — | Femtoguard temperature chuck[6] |
| Software | — | Velox 3.2[7] |
| Microscope | — | eVue III pro Digital Microscope[7] |
| Objective | — | 10X Mitutoyo Plan Apo Objective[7] |
| Microchamber | — | Included[1] |
| Cooling unit | — | ATT C60-60 Cooling Unit[7] |
| Temperature control unit | — | ATT CMI Temp Control Unit[7] |
| Automation | — | Semi-automatic[1] |
| AttoGuard | — | Included[1] |
| PureLine | — | Included[1] |
| Performance | — | Precision Low Noise[6] |
| Platform type | — | probe station platform[1] |
| Operation | — | semi-automatic[1] |
| Technologies | — | MicroChamber, AttoGuard, and PureLine technologies[1] |
| Chuck | — | precision low-noise Femtoguard temperature chuck[6] |