Waferpedia

Comparison ledger

0010-03254 E ChuckversusNanospec 6100

Applied Materials 0010-03254 E Chuck, Onto Innovation Nanospec 6100, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
Nanospec 6100Onto Innovation
OEMApplied MaterialsOnto Innovation
Category——
Wafer size——
Process node——
Introduced——
Production run——
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Lifecycle milestones——
Control system——
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Family—Onto Innovation Nanospec 6100
Cited variants—
Specifications
Measurement Range—25 – 200,000 Å (0.0025 – 20 micrometers)[1]
Optional UV Measurement Range—25 Å – 500 Å[1]
Spectral Range—210 – 800 nm (continuous scanning)[1]
Standard Objective Lenses—4X, 10X, 40X[1]
Optional UV Objective Lens—15X reflecting UV objective[1]
Wafer Size Compatibility—100mm/150mm or 150mm/200mm[1]
Operating System—Windows 95[1]
Microprocessor—32-bit Pentium[1]
Light Source (Standard)—Regulated tungsten halogen lamp[1]
Light Source (Optional UV)—Deuterium UV source[1]
Focusing—Automated focusing[1]
Sources (1)Every fact above is drawn from these public sources
  1. [1]cores.research.utdallas.educores.research.utdallas.edu