Comparison ledger
Applied Materials 0010-03254 E Chuck, KLA RS 55 Auto Resistivity Mapper, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | |
|---|---|---|
| OEM | Applied Materials | KLA |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | KLA RS 55 Auto Resistivity Mapper |
| Cited variants | — |
|
| Specifications | ||
| Equipment type | — | Four-point probe resistivity mapping system[1] |
| Configuration | — | RS55/TC temperature compensation configuration[1] |
| Wafer size | — | Up to 8"/200 mm wafers[1] |
| Wafer handling | — | Manual wafer handling[1] |
| Measurement outputs | — | Contour maps, 3-D plots and diameter scans[1] |
| Temperature compensation | — | Can compensate sheet resistance measurements against ambient temperature and materials[1] |
| Power | — | 115V, 50/60 Hz[1] |
| Measurement capability | — | Surface resistivity measurement[2] |
| Software | — | Omni-Map Rev. 6.51 software with StatTrax[2] |
| Sample size | — | 8"-wafer or below[2] |
| Data storage | — | 2 GB Iomega Drive extra data storage[2] |
| Calibrated range | — | 0.005 Ω to 5 MΩ, NIST traceable[2] |
| Probe head | — | One probe head with desired range included[2] |
| Type | — | Four-point probe resistivity mapping system[1] |
| Outputs | — | Contour maps, 3-D plots, and diameter scans[1] |
| Measurement compensation | — | Can compensate sheet resistance measurements against ambient temperature and materials[1] |
| Measurement range | — | Calibrated (and NIST traceable) range from 0.005Ω to 5MΩ[2] |
| Model | — | RS 55 Auto[3] |
| System type | — | Four-point-probe resistivity mapping system[1] |
| Measurement | — | Surface resistivity measurement[2] |
| Probe heads | — | One probe head with desired range included[2] |