Waferpedia

Comparison ledger

0010-03254 E ChuckversusE 306 A

Applied Materials 0010-03254 E Chuck, Edwards E 306 A, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
E 306 AEdwards
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Edwards E 306 A
Specifications
Configuration—With a CT-200 cryopump and an Oil based Edwards roughing pump[1]
Tool type—Coater[1]
Vacuum & pumping—With a CT-200 cryopump and an oil based Edwards roughing pump[2]
Features—2ea rotating shields that keep deposition and heat off of the belljar[1]
Known issue / consumable note—The thermal baskets need to be replaced as they are expendable items[1]
Included instrumentation—Ion gauge[1]
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com