Waferpedia

Comparison ledger

E 500 EHPversus160 XP Ion

Agilent E 500 EHP, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
E 500 EHPAgilent
OEMAgilentVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAgilent E 500Varian 160 XP Ion
Specifications
ConfigurationMedium Current[1]150mm High Current IMP[2]
Equipment TypeIon Implanter[1]—
Current ClassMedium Current[1]—
Wafer Size8 inch[1]—
Vintage Year1997[1]—

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com