Comparison ledger
Agilent 6177 C DC Current Source, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 6177 C DC Current SourceAgilent | 0010-03485 Magnet AssyApplied Materials |
|---|---|---|
| OEM | Agilent | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 6177 C DC Current Source | Applied Materials 0010-03485 Magnet Assy |
| Specifications | ||
| Line | 104-127 V[1] | — |
| Frequency | 48-63 Hz[1] | — |
| Current | 1 A[1] | — |
| Power | 80 Va Max[1] | — |
| Fuse | 250 V[1] | — |
| Make | Agilent[1] | — |
| Model | 6177 C[1] | 0010-03485[3] |
| Asset # | 149118[2] | — |
| Max Fuse | 250 V[1] | — |
| Condition note | Broken toggle switch[1] | — |
| Configuration | — | WP AL 300mm PVD[3] |
| OEM | — | Applied Materials[3] |
| Description | — | MAGNET ASSY, WP AL 300MM PVD[4] |
| Process | — | PVD[5] |
| Wafer size | — | 300mm[6] |
| Version | — | Spares[6] |
| Part Number | — | 0010-03485[3] |
| Manufacturer | — | Applied Materials[3] |
| Process Type | — | PVD (Physical Vapor Deposition)[3] |
| Application (Material) | — | Aluminum (AL)[3] |
| Wafer Diameter (associated) | — | 300 mm[3] |